H30-UVL Monograph for far and extreme ultraviolet
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Catalog excerpts

H30-UVL Monograph for far and extreme ultraviolet - 1

H30-UVLMonograph for far and extreme ultraviolet Explore the future Automotive Test Systems I Process & Environmental I Medical I Semiconductor I Scientific

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H30-UVL Monograph for far and extreme ultraviolet - 2

Applications • Tunable light source • FUV Reflectometry/ Absorption • Plasma Physics Study • High Harmonic Generation The H30-UVL is especially designed for analyzing from high EUV to UV range in high vacuum environment and can be used as a monochromator (slit-slit) or spectrograph (slit-CCD). The H30-UVL is built around a single toroidal aberration corrected grating using the holographic Variable Line Spacing, VLS technology. It has been calculated to reduce astigmatism not only on its optical axis but over a large exit plane in all directions (25 x 10 mm corrected plane) making it ideal...

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H30-UVL Monograph for far and extreme ultraviolet - 3

Thanks to the corrected grating that provides a true flat field spectrum whatever the selected wavelength, the exit port can be either a slit or a CCD port. Theoretical absolute efficiency of H30-UVL with a Pt and AlMgF2 coating Standard Configuration Optical design Pumping flange Options • Exit port can be CCD port. Easily interchangeable by user • Removable entrance arm * using 10 micron slit and 2 mm slit height at 121 nm in monochromator mode Accessories • UV Light Sources • Single channel detection • CCD detectors • Laser kit for easy alignement • HM mirror chambers • Sample compartment

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H30-UVL Monograph for far and extreme ultraviolet - 4

Explore the future Automotive Test Systems I Process & Environmental I Medical I Semiconductor I Scientific This document is not contractually binding under any circumstances -Printed in France - ©HORIBA Jobin Yvon 09/2016

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