CMP Retainer Rings - GREENE TWEED - #1

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© 2005, Greene, Tweed all rights reserved All trademarks are property of their respective owners. 05/05-GT DS-US-SC-053 c m p r e t a i n e r r i n g s / p r o d u c t d a t a www. g t s e m i . c o m ARLON®-BASED CMP RETAINER RINGS High Performance Materials and Precision Design PLASTIC COMPONENTS Greene, Tweed’s CMP Retainer Rings are formulated, designed and machined to meet the unique customer-specific requirements demanded by Chemical Mechanical Planarization (CMP) processes. Manufactured from a full range of chemical-resistant materials including Greene, Tweed’s own Arlon® (polyketone-based) material and other compounds, these high-performance thermoplastics are ideal for applications requiring exceptional strength, wear resistance and purity. FEATURES & BENEFITS • Excellent chemical resistance • Various high-performance blends DESCRIPTION Arlon 1000—Virgin Polyketone-based Arlon 1260—Carbon-Fiber Reinforced Polyketone-based Arlon 1286—Carbon-Fiber Reinforced Polyketone-based Arlon 1330—PTFE Filled Polyketone-based Legend 1 – No attack, possibly slight absorption. Negligible effect on mechanical properties. 2 – Slight attack by absorption. Some swelling and a small reduction in mechanical properties likely. May limit load bearing capabilities under tension. 3 – Moderate attack or appreciable absorption. Material may have limited life. Applications involving tensile stress not recommended. 4 – Material will dissolve or suffer chemical attack in a short time. Conc. – Concentrated Aqueous Solution RECOMMENDED PROCESS APPLICATIONS CONCENTRATION TEMP. RANGE CHEMICAL WEIGHT % 135ºC Acetic Acid 10 1 1 Ammonia Conc. 1 1 Ammonium Chloride 37 1 1 Ammonium Hydroxide 10 1 3-4 Nitric Acid 10 1 1-2 Oxalic Acid 10 1 1 Potassium Hydroxide 10 1 2 Sulfuric Acid <40 2 2