UPW Boron Analyzer - GE Analytical Instruments - #1

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GE Power & Water Water & Process Technologies Anolylical InsU urnents Fact Sheet Sievers UPW Boron Analyzer ContsnuQUS, online rnonitoring of part-per-trillion levels of boron Overview Ihe revolutionary Sievers* UPW Boron Analyzer is the first on-line instrument to enable continuons, unattended online rnonitoring of part-per-trillion levels of boron in deionized ultrapure water (UPW) applications. GF Analytical Instruments dnveloped this patented UPW Boron Analy/er in coopération with semiconductor manufacturera. As the dimensions of Ihe semiconductor components continue to shrink, colloidol silica is becoming increasingly critîcal to remove from semiconductor UPW. The most valuable use of this analyzer is to minimise and contrai the Icakagc of colloïdal and ionic silica from ion removal processes like mixed-bed ion exchange and electronic deionîzation (EDI) to improve chip yield. Additionally, it is used to control the deioni/ation process to meet the Process Optimization Numerous published articles1 s identify boron as the best indication of mixed-bed ion exchange resin exhaustion lor the effective removal of both silica and boron. At the point of measurable increase in silica concentration. boron breakthrough has typically been underway for o ^ ITRS 0.050 ppb boron limit in semiconductor UPW. It is designed specifically to meet the needs of facility managers, Dl water engineers. and fab process engineers. ■1 ■ 4 I I li On-line Performance Possessing the port pcrtrillion sensîtivity of ICP/MS1 (Figures 1 and 21 the Boron Analyzer ensures the effective control of silica and boron, compliance with primary □nd polish loop boron spécifications, and the minimization of colloidal and ionic silica. At up to ten analyses per hour. facility manogers can protect against upset conditions thot would go undetected with ICP/MS or other laborotory analysis methods. Rgur* L Ccxnparcon of bw-leud boron occurocy usina the Boron Anolyra and ICPMS Figur» Z. Cc*npanson of high-level boron occurocy usina the Bc*on Ana^er ond ICPMS