Rotary Union Rotodisk S-HP - GAT - #1

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Rotary Union Rotodisk S-HP - GAT
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Rotary Union Rotodisk S-HP - GAT


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Rotary union, Slip ring, Fitting, Lubrication unit


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GAT Gesellschaft für Antriebstechnik mbh • Industriestraße 11 • D-65366 Geisenheim (Germany) +49 6722 93788-0 +49 6722 93788-110 info@gat-mbh.de www.g @ at-mbh.de § § § § § § § Product Features Rotodisk S-HP The construction of these products is specially designed for the high axial forces that occur at these pressure levels. The bearings with increased load capacity guarantee equally high product lives, even at rotation rates of up to 30.000 rpm, as with our proven Rotodisk models for the normal pressure of 70 bar. The face seals are made of silicon carbide that almost has the same hardness than diamond. The sealing discs are mechanically clamp mounted. By using this technology, a safe mounting is attained, that is resistant to deep hole drilling oil, and which can completely eliminate shattering of the ceramic plates. Design and Function For high pressures up to 200 bar Clamped silicium carbide face seals With precision spindle or hybrid ball bearings Very robust triple bearing system Safe leakage drain with dual chamber system For mediums: Emulsion, gun drilling oil Dry running safe Technical Data Model S00-HP 11042 S0-HP 11050 S0-HP 9494 S2-HP 9425 Operating speed max. [min-1] 20000 30000 15000 30000 Emulsion pressure max. [bar] 200 120 120 150 Flow rate max. [L/min] 45 70 70 70 Nominal diameter [mm] 6 8 8 8 The requirements in the tooling machine industry for internal coolant supply lead to coolant pressures of up to 200 bar, due to the continuously increasing chips volume and the increasingly larger drilling depths. We have developed a new line of Rotodisk rotating unions especially for these applications, which stand out due to their robust bearing system and the optimized face sealing system. The problem of detaching face seals, which occurs frequently in the case of deep hole drilling, is completely resolved due to a new sealing disc mounting technology. Application Changes in the sense of the technical progress reserved. rev: 10/2003

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