SAT Dump Rinse - Fluorosat - #1

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SAT Dump Rinse The system described in this patent is used in the semiconductor industry for the cleaning in deionized water (DIW) of silicon wafers that are cleaned by the action of water from previous cycles of treatment with acids or solvents. The pool and facilities described below are all housed inside covers of process treatment with acids or solvents. This system allows two different methods (dump and overflow) for washing the wafer. In this patent are introduced, the systems already in use, two significant changes, aimed at improving the processes. The first option allows you to enrich the water with nitrogen and is translated into practice through substantial modification of the discharge valve and the other is, during the various stages of washing, the rotation of the wafer carrier