Superior reduction of large particle counts
for im proved yields
OP TIMA™ CMP fil ter cap sules are high ca pac ity depth
fil ters op ti mized for ox ide and metal slur ries used in
chem i cal me chan i cal planarization (CMP) ap pli ca tions.
OP TIMA CMP fil ters are com posed of all-poly propy lene
com po nents and fea tures a multi-zone "graded-po ros -
ity" de sign for the op ti mum level of par ti cle
clas si fi ca tion. This novel con struc tion pro vides en -
hanced flow char ac ter is tics, in clud ing low pres sure
drop, to min i mize shear ing of the slurry while pro vid ing
su pe rior ser vice life.
The ob jec tive of a slurry fil ter is for the ma jor ity of par ti -
cles to pass through it un changed, while only re mov ing
the un de sired or “over sized” par ti cles. The over sized
par ti cle pop u la tion is com monly re ferred to as large
par ti cle counts (LPC) and they typ i cally form over time
when the sus pended par ti cles in the slurry set tle form -
ing ag gre gates, ag glom er ates, and gels. Large
par ti cles can also be the re sult of ad verse ship ping
con di tions, shear ing, slurry dry ing, and in ter ac tion with
other dis tri bu tion loop com po nents such as fit tings,
tanks, pip ing, valves, and pumps. These large par ti cles
can scratch metal and interlevel di elec trics po ten tially
caus ing wa fer de fects.
CUNO’s OP TIMA CMP
filter re duces large par ti cle
counts that can po ten tially re duce yields while main -
tain ing the pol ish ing char ac ter is tics of the slurry.
1
Feature Benefit
+ Graded Porosity Design + Superior removal of hard and soft gel contaminants, for reduced
defectivity and improved yields
+ High contaminant holding capacity reduces downtime and increases
overall equipment effectiveness
+ The
filters are "matched" to the slurry providing the optimum level of
performance needed to dramatically reduce defect causing particles
+ Provides a low pressure drop reducing the potential for fluid shear of
the slurry
+ 100% Polypropylene
Construction
+ Low capsule extractables, free of adhesives, binders, and surfactants
+ Excellent chemical compatibility with low and high pH slurries
+ Quality Manufacturing + ISO certified quality management system
+ Manufactured and double-bagged in a clean environment to provide
superior downstream cleanliness out of the package
+ Built to Exacting Specifications + Provides a consistent quality of slurry enabling repeatability of the
planarization process
+ Fully Disposable Capsule + Rapid installation
+ Reduced downtime
+ Reduced handling of hazardous chemicals
Disposable Filter Capsules on Target for CMP Particle Classification
PTIMA CMP TM
®
Cuno Incorporated
Ap pli ca tions
? Semiconductor – Oxide/Low-k Dielectrics, Shallow Trench
Isolation (STI), Interlevel Dielectric (ILD), Polysilicon, Tungsten,
and Copper
? Data Storage – Magnetic Heads, Nickel and Glass Substrates
? Data Transmission – Optical Fiber
? Compound Semiconductor - Light Emitting Diode (LED)
