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® a 3M company

MDC Capsules for pilot scale production up to 5 gallons - 7182 NanoSHIELD MDC Filter Capsules

®

Superior Defect Reduction from Advanced Photoresists and Chemicals peat abil ity out of the box.

Ap pli ca tions 193nm Photoresists Alcohols ARC, BARC, TARC Bases

NanoSHIELD MDC filter capsules have beenspecially designed to reduce wafer level defects from advanced photoresist and ancillary chemical applications. Utilizing Hollow Fiber Technology (HFT), NanoSHIELD fil ters are able to deliversuperior flow with minimal pressure drop, while maintaining the highest level of filter efficiency in a com pact design. The small com pact de sign of NanoSHIELD MDC fil -ter cap sules make them ide ally suited forap pli ca tions re quir ing low hold-up vol ume with su pe -rior flow rates and high par ti cle re ten tion at 0.01,0.02, 0.05, and 0.1 µm.

Etchants / Strippers Developers Polyimide Solvents

NanoSHIELD Cap sule Con struc tion

Typ i cal 1 cps Flow vs Dif fer en tial Pres sure @ 25 C

Man u fac tured in a clean room en vi ron ment from poly propy lene and poly eth yl ene ma te ri als,NanoSHIELD cap sules will not con trib ute to ionic,or ganic, and me tal lic con tam i nant lev els in the pro - cess fluid. Ionic, or ganic, and me tal lic con tam i nantscan ex tract from sur face mod i fied and or im prop erlyman u fac tured fil ters, which may re duce shelf life, orchange the photo-speed and mo lec u lar weight ofthe photo-chem i cal. NanoSHIELD MDC cap sulesare crit i cally cleaned, in teg rity tested, and rinsedwith 18 meg ohm DI wa ter to min i mize extractablesand al low pro cess re

NSP005P50 NSP010P50 NSP001P30 NSP002P30 NSP010P30 & NSP002P50 NSP005P30 & NSP001P50 Differential Pressure (bar) Differential Pressure (psid) 00.20.40.6 Fluid Flow Rate (GPM)Fluid Flow Rate (LPM) 00246810 0512341.00.51.5

Fea turesBen e fits

More surface area as compared to equivalent sized capsules Hollow Fiber Technology Provides both lower operating and differential pressure across the filter tominimize outgassing and micro-bubble formation Increased lifetime, throughput, and overall equipment effectiveness (OEE) Polypropylene andPolyethylene Construction Excellent chemical resistance to ARC’s, photoresists, and solvents No pre-wetting required for solvent based chemicals 0.01 µm and 0.02 µmRetention Ratings Superior removal of particles, gels, and micro-bubbles Reduced micro-bridge and wafer level defects for 193nm photoresists Superior Flow Rates Flow rates 3 - 5 times higher as compared to equivalent size competitivepleated capsules while not sacrificing particle removal efficiency Quality Manufacturing All filters are critically cleaned and tested in a cleanroom to reduce particleadders and extractables