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LHV Tubes for laboratory testing on new formulations - 3M Purification Inc.


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a 3M company
NanoSHIELD™ LHV FilterTubes
Low Hold-Up Volume Testing of Experimental Photoresists and Ancillary Chemicals
offered in several configurations to allow the end user to match the volume of fluid with the appropri­ate filter in an effort to reduce chemical waste.
NanoSHIELD LHV filter tubes are ideally suited for critical applications requiring high particle retention and high flow rates at 0.01, 0.02, 0.05, and 0.1 urn.
Full Scale-Up - The NanoSHIELD Filter Family
Laboratory Testing on New
Formulations
LHV Tubes
(Not Shown)
NanoSHIELD LHV filter tubes have been specially designed to provide superior particle retention and low hold-up volume for advanced photoresists and ancillary chemicals. Utilizing Hollow Fiber Technol­ogy (HFT), NanoSHIELD filters are able to deliver high flow rates with low hold-up volume, to minimize the waste of experimental photoresist formulations. The tubes are offered in 1/4" and 3/8" outside diam­eters thereby allowing common compression fittings to connect directly to the outside of the NanoSHIELD LHV tube. In addition, a syringe can also be injected directly into the tube.
These small compact filter tubes allow material sup­pliers to assess parameters such as material compatibility, photo-speed, particle retention, and li­thography in a rapid and cost effective manner. NanoSHIELD LHV filter tubes contain the same filter media as full size NanoSHIELD filter cartridges and capsules, ensuring a consistent level of quality throughout laboratory, pilot, and full-scale produc­tion testing. The NanoSHIELD family of products is
Pilot Scale Production up to 1 gallon
SDC Capsules
Pilot Scale Production up to 5 gallons
MDC Capsules
Pilot Scale Production up to 100 gallons
LDC
Capsules
Full Scale Production greater than 100 gallons
Filter
Cartridges
Applications
■ 193nm Photoresists
■ Alcohols
■ ARC, BARC, TARC
■ Bases
■ Etchants / Strippers
■ Developers
■ Polyimide
■ Solvents
Features
Benefits
Hollow Fiber Technology
■ More filtration per surface area as compared to pleated filters
■ Provides both lower operating and differential pressure across the filter to minimize outgassing and micro-bubble formation
Polypropylene and
Polyethylene Construction
■ Excellent chemical resistance to photoresists and ancillary chemicals
■ No IPA pre-wetting and system flushing required
0.01 urn and 0.02 urn Retention Ratings
■ Superior removal of particles, gels, and micro-bubbles
■ Reduced micro-bridge and wafer level defects for 193nm photoresists
Small Compact Design
■ Reduced hold-up volume and waste of expensive chemicals
Á

pageCatalog pdf di En 2012-05-20-16