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LDC cartridge for pilot scale production up to 100 gallons - 3M Purification Inc.


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a 3M company
NanoSHIELD™ LDC Filter Capsules
Superior Defect Reduction from Advanced Photoresists and Chemicals
NanoSHIELD LDC filter capsules have been specially designed to
extract from surface modified and or improperly manufactured filters, which may reduce shelf life and or change the photo-speed, viscosity, or molec­ular weight of the photo-chemical.
combine the highest level of particle retention with superior flow rates and minimal pressure drop for demanding high viscosity chemical applications. Utilizing Hollow Fiber Technology (HFT), NanoSHIELD filters are
•I
Applications
■ 193nm Photoresists
■ Alcohols
■ ARC, BARC, TARC
■ Bases
■ Etchants / Strippers
■ Developers
■ Polyimide
■ Solvents
able to deliver superior flow with minimal pressure drop, while maintaining the highest level of filter efficiency in a small disposable design.
All filters are critically cleaned, integrity tested, and rinsed with high purity water to provide fast start-up times and low extractables right out of the box. The small compact design of NanoSHIELD LDC filter capsules make them ideally suited for critical appli­cations requiring low hold-up volume with superior flow rates and high particle retention at 0.01, 0.02, 0.05, and 0.1 pm.
NanoSHIELD Capsule Construction
The filters polypropylene and polyethylene materials of construction combined with quality manufacturing ensure that ionic, organic, and metallic contami­nants are not being added back into the process fluid. Ionic, organic, and metallic contaminants can
5"LDC Capsule Flow vs Differential Pressure (1cps @ 25°C)
10
0.6
8
<5
6
a m
iL
0.4
4
ˇ5 c
Ol
a 5
c
m
S 5
0.2
2
0
6
2 4
Fluid Flow Rate (GPM)
0
5 10 15
Fluid Flow Rate (LPM)
0
20
Features
Benefits
Hollow Fiber Technology
■ Up to 3 times more surface area as compared to equivalent sized capsules
■ Provides both lower operating and differential pressure across the filter to minimize outgassing and micro-bubble formation
■ Reduces hold-up volume and "dead space" by eliminating the filter core
■ Increased lifetime, throughput, and overall equipment effectiveness (OEE)
Polypropylene and
Polyethylene Construction
■ Excellent chemical resistance to photoresists and ancillary chemicals
■ No IPA pre-wetting and system flushing required - eliminates a potential source of contamination and chemical interaction, while reducing downtime
0.01 urn and 0.02 urn Retention Ratings
■ Superior removal of particles, gels, and micro-bubbles
■ Reduced micro-bridge and wafer level defects for 193nm photoresists
Superior Flow Rates
■ Flow rates 3 - 8 times higher as compared to competitive pleated capsules while r sacrificing particle removal efficiency
lot
A
Quality Manufacturing
■ Manufactured in a cleanroom to reduce particle adders and extractables
■ All filters are critically cleaned and integrity tested to ensure process repeatability

pageCatalog pdf di En 2012-05-20-16