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| | | a 3M company | | |
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| | | NanoSHIELD® Polypropylene Filter Cartridges High Flow Rates and Superior Defect Reduction for Advanced Chemicals | | |
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| | | Typical Cartridge Flow vs Differential Pressure (1cps @ 25°C) | | |
| | | NanoSHIELD polypropylene filter cartridges have been engineered to combine the highest level of particle retention with superior flow rates and minimal pressure drop for demanding applications at the 45 nm node. Peak Performance Provided by Hollow Fiber Technology (UFT) | | |
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| | | 5" NanoSHIELD Cartridge | | |
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| | | 1C | | |
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| | | 1.0 2.0 3.0 4.0 5.0 6.0 7.0 8.0 FluidFlowRate(GPM) 5 10 15 20 25 30 Fluid Flow Rate (LPM) 10" NanoSHIELD Cartridge | | |
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| | | NanoSHIELD filter cartridges with HFT provide up to 2 times more surface area and up to 5 times higher flow rates at the same pressure drop when compared to pleated membrane cartridges. This increase to flow and decrease to pressure drop allows a typical 10" NanoSHIELD filter cartridge to perform similarly to a 20" pleated filter cartridge. This significant advantage allows for the use of smaller and less costly filter housings which reduce hold-up volume, filter change-out times, and total cost-of-ownership for the life of the process. In addition, CUNO's HFT produces a membrane that is up to 2 times thicker than other technologies which in turn maximizes the depth of filtration and particle removal efficiency. | | |
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| | | C.6 | | |
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| | | C.4 | | |
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| | | C.2 | | |
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| | | 1.0 2.0 3.0 4.0 5.0 6.0 7.0 8.0 Fluid Flow Rate (GPM) | | |
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| | | 1C | | |
| | | 2t | | |
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| | | FluidFlow Rate (LPM] | | |
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| | | 20" NanoSHIELD Cartridge | | |
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| | | | | | | | | | Applications | | | | ■ ARC, BARC, TARC | ■ Alcohols | | | | ■ 193 nm Photoresists | ■ Bases | | | | ■ Polyimide | ■ Developers | | | | ■ Solvents | ■ Etchants / Strippers | | | | | | | | | |
| | | C.4 | | |
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| | | 2.0 4.0 6.0 8.0 10.0 Fluid Flow Rate (GPM) 10 20 30 40 Fluid FlowRate(LPM) | | 12.C | | |
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| | | | | | | | | | Features | Benefits | | | | ■ Hollow Fiber Technology | ■ Up to 2 times more surface area as compared to equivalent size pleated filters ■ Increased depth (2x thicker) of filtration results in improved particle retention | | | | ■ Large Surface Area | ■ Up to 5 times higher flow rates as compared to other pleated cartridges ■ 10" NanoSHIELD cartridges flow similar to 20" pleated cartridges ■ Increased lifetime, throughput, and overall equipment effectiveness (OEE) | | | | ■ Compact Filter Design | ■ Allows for smaller, less costly filter housings ■ Reduces hold-up volume, exposure, and waste of expensive chemicals | | | | ■ 0.01 urn and 0.02 urn Retention Ratings | ■ Superior removal of particles, gels, and micro-bubbles ■ Reduced micro-bridge and wafer level defects for 193 nm photoresists | | | | ■ Quality Manufacturing | ■ Manufactured in a cleanroom to reduce particle adders and extractables ■ Filters are critically cleaned and tested for process repeatability | | | | | | | | | |
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